Shubhadeep Majumdar

Experimental process engineer with 4+ years building, developing, and troubleshooting thin-film deposition and plasma processes end-to-end — from custom reactor design to reproducible, multi-user process recipes. Built a working ICP-CVD reactor from scratch (chamber geometry, gas delivery, plasma coupling, vacuum integration) and has developed stable PECVD/PVD process windows across four independent deposition platforms. Track record of turning fundamental surface-science insight into process parameters that measurably change device performance.

PhD Researcher — Thin-Film & Plasma Processes at University of Barcelona (2023-11 – Present)

Plasma process parameters, thin-film microstructure, and surface state as levers for material performance.

• Developed a pulsed-DC magnetron sputtering process for Mo₂C thin films and identified a controlled surface-oxidation step that lowers charge-transfer resistance, overturning the field's default low-oxygen-exposure approach; validated with correlated XRD/XPS/electrochemical process–property maps (first-author, Applied Surface Science, 2026).
• Built a CVD process to grow high surface area carbon nanotube scaffolds and engineered an in-situ carburization pathway that forms Mo₂C directly on the CNT surface, removing the need for an external precursor gas (first-author, Int. J. Hydrogen Energy, 2024).
• Ran DoE-guided optimization of a Ni–Mo co-electrodeposition process across voltage, time, and annealing conditions; isolated deposition temperature as the dominant lever for phase and performance control, directly informing process window design.

R&D Intern — Master's Thesis at Advanced Nanotechnologies (2021-07 – 2022-07)

Building an ICP-CVD reactor to deposit fluorless amphiphobic coatings.

• Designed and built an ICP-CVD reactor from scratch including chamber geometry, gas delivery, plasma coupling, and vacuum integration, as the enabling platform for a new thin-film coating process.
• Developed and validated process recipes for the built ICP-CVD reactor through systematic parameter studies, achieving reproducible film properties across multiple substrate types.

Master's Research Project at TU Ilmenau (2020-08 – 2021-04)

Fabricated memristive devices for neuromorphic computing using MoS₂.

• Fabricated 2D-material memristive devices using E-beam lithography, photolithography, RIE etching, and precision material transfer, gaining full cleanroom process ownership from nanoscale patterning through electrical characterization.

Engineering Intern — Bachelor's Thesis at India Pistons Ltd. (2018-10 – 2019-03)

• Designed and ran the company's first cryogenic heat treatment trial for a high-volume manufacturing of bevel gear line (orbital cold forming); root cause identified as grain-boundary cracking as the failure driver and delivered a process change yielding ~1,000 additional gears per die.

PhD in Nanoscience – University of Barcelona (2023 – 2027)

M.Sc. in Micro and Nanotechnology – TU Ilmenau (2019 – 2022)

B.Tech. in Mechanical Engineering – SRM Institute of Science and Technology (2015 – 2019)