Anand Gopal

To seek a challenging career in a professional environment and utilize my knowledge, skills which I have acquired during my educational career. Ability to quickly learn and apply new technologies as well as ideas. Ability to manage multiple priorities within the organization.

During my master’s degree, I gained core skills in micro-and nanotechnology, data analysis, and technical processing in addition to learning the importance of time management, collaboration, and precise communications. I am confident that these experiences have prepared me to transition easily onto your team. So, I strongly feel that I can contribute a lot to the goals of this team with my practical educational experience.

During my experience with Fraunhofer ENAS, I had an opportunity to work with the professionals. As apparent from my CV, I have experience in fabrication of wafers using magnetron sputtering (PLD) method and demonstrated proficiency in Electrical Characterization of memristors with different BFO wafers using Keithley 2400 source meter, Keithley 4200-SCS automatic test equipment and LabView Software Interface to understand the switching properties of a Non-volatile

Memories (Memristor). And structural and chemical analysis of the wafer is carried out using XPS, SIMS,

SEM, EPMA and XRD analyses. Data analysis was performed using Python with the data obtained from

Electrical Measurements and optical measurements. Performing discrete high-temperature treatments on specific layers of interest would give more information regarding the physical properties of the thin film. Optimized electrical characteristics of the Semiconductor, stoichiometry, and crystal structure characterization. The reliability of the Semiconductor was analyzed using endurance measurements.

Memristors are non-volatile memory devices and are suitable for storing digital states and are already being used in so-called Re-RAM memories.

I have experience in the development, implementation, and maintenance of semiconductor technologies, as well as success in yield planning, root cause analysis and corrective action. I am also highly skilled in advanced statistical methods and have a strong understanding of process and equipment capabilities. Capability of conducting extensive research and analysis to discover the solution to the problem.

I possess the capacity to utilize knowledge of Semiconductor technologies to achieve desired objectives.

Characterization of different bismuth iron oxide thin films with respect to composition, structural and memristive properties

• Characterization of 100 mm, 150 mm and 200 mm BFO wafers produced at Fraunhofer FEP.

•Resistive switching in self and aliovalent doped BFO thin films deposited by Pulsed laser deposition with Au electrode (DC sputtering).

•Electrical Characterization of the Wafers using Keithley-4200-SCS Automatic prober, Keithley 2400 source meter and LabView software Interface.

• Modelled conduction behavior of memristors in high and low resistance states via extensive studies.
• Analysis of stoichiometry and crystalline properties of the wafers by XPS, SIMS, SEM, EPMA and XRD analyses.
• Data Analysis and documentation of the obtained raw data through measurements using Python
• Carrying out individual high-temperature treatments on selected single layers.
• Performed ellipsometry measurements as well as modelling/research of optical properties in multiferroic BFO.