Rohit Sharma

Postdoctoral Research Fellow with expertise in RF plasma etching, plasma-assisted surface modification, thin film deposition, graphene transfer, nanostructured coatings, and advanced materials characterization. Currently working at the Facilitation Centre for Industrial Plasma Technologies (FCIPT), Institute for Plasma Research (IPR), India, developing plasma-engineered functional surfaces for SERS, superhydrophobic coatings, and atmospheric water harvesting. Experienced in plasma processing of metals, polymers, and carbon-based materials with strong hands-on expertise in sputtering, plasma etching, surface wettability engineering, and nanomaterial characterization.

Author of 22 SCI-indexed publications, 3 conference proceedings, and 1 Indian patent, h-index and citation is 309 and 11 respectively.

Postdoctoral Research Fellow - Institute for Plasma Research (IPR) - Gandhinagar, India

(2023-11 - 2026-07)

• Plasma surface modification for the various surface such as natural fiber jute, polymer and metal surface (Cu) for wettability application
• Fabricating the graphene and Metal nanoparticle-based hybrid interface on the ion-beam induced silicon ripple for SERS application
• Lab maintenance and mentoring PhD/Masters student
• Writing research article and reports

10th - Hindi, English, Mathematics, Social Science, Science - Board of School Education Haryana (2010 - 2010)

12th - Physics, Chemistry, Mathematics - Board of School Education Haryana (2012 - 2012)

BSc (Hons) - Physics - Atma Ram Sanatan Dharma College, University of Delhi (2015 - 2015)

MSc (Hons) - Physics - Central University of Punjab (2015 - 2015)

PhD - Nanoscience and Technology - Amity University Uttar Pradesh (2023 - 2023)