Wan Erl Chong

A self-motivated graduated engineer with prior working experienced and knowledge of wafer ion implantation process at semiconductor company. Passionate about seeking an engineering position, leveraging my prior experience while utilizing my expertise, strong interpersonal skills, and ability to multitask in high-pressure situations.

Currently, I worked closely with UMC's medium current implantation diffusion team as assistant engineer to optimize implantation processes. Main responsibilities included to identify and resolve issues related to beam tuning and implantation, such as beam uniformity, beam fluctuations. Besides, optimized and fined-tuned various ion beam parameters to ensure precise control over the implantation process.

Moreover, I engaged in basic troubleshooting procedures whenever the implantation tool encountered alarms and triggered the FDC chart. In addition, I also collaborating with engineers to maintain detailed records of beam tuning parameter, process conditions, and results.

I graduated with a Bachelor of Engineering (Hons) in Chemical Engineering with merit and achieved an IELTS band score of 6.